New High-Flow 30nm Filter Features Unique Membrane for Hydrofluoric Acid Bath Filtration

Pall Corporation is featuring a new product, the Ultipleat® SP DR filter. It is designed specifically for high flow and improved particle removal in critical surface preparation chemical baths such as HF, SC1and SC2. This 30-nanometer-rated, highly asymmetric membrane filter is constructed of a specially engineered polymer material. The membrane material has performance-enhancing properties, including a hydrophilic surface, durability, and improved chemical resistance. An additional feature of the filter is dual retention, which provides optimal, consistent filtration performance under many different operating conditions.

     The Ultipleat SP DR filter uses Pall's proprietary highly asymmetrical membrane pore structure. This allows membrane filtration to extend to the 30-nanometer pore size range while maintaining flow rates of more open conventional membrane filters. For example, the Ultipleat® SP DR filter requires less than one-half the pressure to accommodate the same liquid flow rate as a conventional polyethylene membrane filler with the same 30-nanometer rating.
     Pall's proprietary asymmetrical pore structure has dual retention mechanisms that capture particles by adsorption, and perform positive mechanical sieving. These mechanisms continue to function if the environment has changing conditions of pH, viscosity, or flow conditions. Some of the benefits for users are listed in the table below. The Ultipleat SP DR filter has been well-received by customers, and many of the largest semiconductor manufacturers are already using or testing this exciting new process-enabling filter.

Pall will be showcasing the filter at Semicon West, which will be held in San Francisco from July 17 to 19, 2007. Stop by booth number 1606 (South Hall). For more information Click Here...or call 1.925.443.9800.